Lithography
E-Beam Lithography
Our Electron Beam technology is some of the most advanced of its type in the UK for fabrication inclusive of mask and reticle making services and advanced direct write for various applications. Equipment includes:
A Leica Cambridge VB6 Vector Beam for nanolithography, with ultra high resolution and operating at 100kV
An EBL300 capable of processing masks and direct-write onto different substrates
Direct Write
At Qudos we have extensive experience of Direct-Write for development, prototyping and pilot production. We work with a wide range of e-beam resists, providing a resolution down to 20nm if required, using the latest cutting edge materials.
Photo-Lithography
We provide a service for patterning wafers using a step and repeat lithography system, resolving to 0.8 microns. We also have a contact aligner that can resolve 1-1.5um and handle 2 - 6 inch wafers. The system is also capable of double-sided alignment.