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Dry Etching

We have two methods of dry etching: DRIE for silicon and RIE for Oxide, Nitride, other dielectrics and metals including Chrome, Aluminium and Ti-tungsten. Other materials can be etched to customer requirements, provided chemistries are available.

We have broad knowledge and solid experience of etching sub-micron features, particularly for optical grating devices, displays and sensors.

STS DRIE Tool

Structures Etching using the STS DRIE

Legal Notice

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