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Photo-Lithography We offer a service for patterning wafers using a
step and repeat lithography system. This is capable of resolving
to 0.6 microns. Substrate sizes can be 3 - 6 inch and maximum
1mm thick. We also have two contact aligners which can resolve
down to 1 um, one can handle 2 - 4 inch substrates and the other
can handle 6 and 8 inch substrates.
Our masks and reticles can be used on a variety
of lithography tools including all of our own systems. If you
have a query about compatability, please e-mail
or phone us to discuss your requirements.
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